1.1. Introduction to Microbeam Techniques

A large number of microbeam techniques (those that use sharply focused incident beams of particles or energy) have been developed for the analysis of geological materials. The table below lists the more familiar techniques.

Incident Beam

Technique

Secondary Effect or

 Measured Signal

White light

Reflected light microscopy

Polarized light microscopy

UV-IR microspectrometry

Reflected light

Transmitted light

Transmitted light

Continuous laser light

Micro-Raman spectrometry

Selected-area gas release mass spectrometry

Scattered light

Heat & Released gas

Pulsed laser light

Laser-ablation inductively-coupled plasma mass spectrometry (Laser ICP-MS)

Volatilized material

X-rays

X-ray microscopy

Micro X-ray fluorescence analysis (Micro XRF)

Transmitted X-rays

Characteristic X-rays

Electrons

Transmission electron microscopy (TEM)

Atomic number imaging and analysis

Scanning electron microscopy (SEM)

Electron microprobe analysis (EMPA)

Cathodoluminescence microscopy

Auger microprobe analysis

Transmitted electrons

Backscattered electrons (BSE)

Secondary electrons

Characteristic X-rays

Visible light

Auger electrons

High-energy protons

Proton-excited X-ray emission analysis (PIXE)

Characteristic X-rays

Low-energy ions

Ion microprobe analysis (IMP)

Sputtered secondary ions

Most techniques are non-destructive, but several (in italics above) result in sample damage (pitting). In laser ICP-MS, incident pulsed laser light volatilizes material from the sample, and in IMP (SHRIMP = Sensitive High Resolution Ion MicroProbe) low-energy ions ablates the sample leaving holes.

Nondestructive techniques are more numerous. Many use characteristic X-rays to analyze the sample material. Micro XRF uses an incident X-ray beam to produce X-rays; EMPA, scanning electron microscopy (SEM), and cathodoluminescence microscopy utilize a focused electron beam to produce characteristic X-rays, secondary electrons, and visible light, respectively, from the sample. PIXE uses a focused beam of high-energy protons to produce characteristic X-rays from the sample.

This course will focus on electron microprobe (EMP) analysis, which is probably the most commonly applied micro-analytical technique for materials analysis. In addition to characteristic X-rays, most microprobes are equipped to analyze other effects produced by electron bombardment of a sample, including backscattered electrons, secondary electrons, and cathodoluminescence. Thus the study of EMP analysis will incidentally cover many of the other analytical techniques. In addition, this course will briefly cover X-ray fluorescence (XRF) analysis, a non-microbeam technique very similar to EMP analysis, because it is a very commonly utilized for materials analysis.


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Copyright, James H. Wittke, 1997-2003

Last update: 01/18/2006 01:47 PM.